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1 high-rate sputtering
high-rate sputtering Hochrate-Sputtern nEnglish-German dictionary of Electrical Engineering and Electronics > high-rate sputtering
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2 high-rate sputtering
Микроэлектроника: высокопроизводительное распыление -
3 high-rate sputtering
високопродуктивне розпилюванняEnglish-Ukrainian dictionary of microelectronics > high-rate sputtering
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4 sputtering
розпилювання Процес випуску атомів або групи атомів з поверхні катода (негативного електроду) у вакуумній трубці як результат дії важких іонів. Цей процес використовується для осадження тонкого шару металу на скло, пластик, метал або іншу поверхню у вакуумі - bulk sputtering
- cathode sputtering
- dc sputtering
- diode sputtering
- high-rate sputtering
- ion-beam sputtering
- laser sputtering
- magnetron sputtering
- physical sputtering
- plasma sputtering
- radio-frequency cathode sputtering
- reactive sputtering
- RF sputtering
- secondary sputtering
- thin-film sputtering
- triode sputteringEnglish-Ukrainian dictionary of microelectronics > sputtering
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5 высокопроизводительное распыление
Microelectronics: high-rate sputteringУниверсальный русско-английский словарь > высокопроизводительное распыление
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6 Hochrate-Sputtern
Deutsch-Englisch Wörterbuch der Elektrotechnik und Elektronik > Hochrate-Sputtern
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7 system
1) система || системный3) вчт операционная система; программа-супервизор5) вчт большая программа6) метод; способ; алгоритм•system halted — "система остановлена" ( экранное сообщение об остановке компьютера при наличии серьёзной ошибки)
- CPsystem- H-system- h-system- hydrogen-air/lead battery hybrid system- Ksystem- Lsystem- L*a*b* system- master/slave computer system- p-system- y-system- Δ-system
См. также в других словарях:
Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
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